Summary

Optical metrology, non-contact characterization, non-destructive evaluation, modulated reflectance, photo-reflectance, pump-probe, semiconductor materials, electrical measurements, electronic band-structure, strain, dopant activation, electronic transport properties, carrier transport, diffusion length, recombination lifetime, diffusion coefficient, process development, on-product measurement, in-line process control, process monitoring, yield, high-volume manufacturing.

Industry

Description

XCALIPR Corporation provides advanced Z-scanning laser photo-reflectance measurement technology for the precise, non-contact characterization of the electronic transport properties of semiconductor materials. The non-contact characterization of such semiconductor electronic transport properties is a long-standing problem in high-volume semiconductor device manufacturing. By enabling early process diagnostics, including process step isolation and rapid information turn around, the XCALIPR technology can be used to quickly improve yield learning and reduce manufacturing costs. The XCALIPR technology is quantitatively superior to other available techniques in terms of measurement sensitivity, acquisition time, spatial resolution, and system simplicity, and fully enables the non-contact evaluation of electronic transport properties directly on device wafers.

Special details

Z-scanning photo-modulated reflectance demo system, with UV probe laser, intensity modulated NIR pump laser, microscope objective, camera, avalanche photodiode, wideband lock-in amplifier, R-theta stage (accepts 300mm wafers or smaller), manual wafer load/Z adjust, optimized for silicon and silicon-germanium applications. Demo system provides precise, non-contact measurement capability for active carrier concentration (activation level), carrier diffusion length (ambipolar), carrier recombination lifetime, and carrier mobility. Technology readiness level 4-5.

Profile

  • Incorporated in
    Delaware
  • Established since
    2020
  • Main/Branch
    Branch

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